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Scanning Electron Microscopy and X-Ray Microana...
79,02 € *
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This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules - no need to "read it all" to understand a topic Includes

Anbieter: buecher
Stand: 06.07.2020
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Scanning Electron Microscopy and X-Ray Microana...
125,02 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 06.07.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
92,59 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 06.07.2020
Zum Angebot
Basic and Advanced Bayesian Structural Equation...
153,00 CHF *
ggf. zzgl. Versand

This book provides clear instructions to researchers on how to apply Structural Equation Models (SEMs) for analyzing the inter relationships between observed and latent variables. Basic and Advanced Bayesian Structural Equation Modeling introduces basic and advanced SEMs for analyzing various kinds of complex data, such as ordered and unordered categorical data, multilevel data, mixture data, longitudinal data, highly non-normal data, as well as some of their combinations. In addition, Bayesian semiparametric SEMs to capture the true distribution of explanatory latent variables are introduced, whilst SEM with a nonparametric structural equation to assess unspecified functional relationships among latent variables are also explored. Statistical methodologies are developed using the Bayesian approach giving reliable results for small samples and allowing the use of prior information leading to better statistical results. Estimates of the parameters and model comparison statistics are obtained via powerful Markov Chain Monte Carlo methods in statistical computing. * Introduces the Bayesian approach to SEMs, including discussion on the selection of prior distributions, and data augmentation. * Demonstrates how to utilize the recent powerful tools in statistical computing including, but not limited to, the Gibbs sampler, the Metropolis-Hasting algorithm, and path sampling for producing various statistical results such as Bayesian estimates and Bayesian model comparison statistics in the analysis of basic and advanced SEMs. * Discusses the Bayes factor, Deviance Information Criterion (DIC), and $L_nu$-measure for Bayesian model comparison. * Introduces a number of important generalizations of SEMs, including multilevel and mixture SEMs, latent curve models and longitudinal SEMs, semiparametric SEMs and those with various types of discrete data, and nonparametric structural equations. * Illustrates how to use the freely available software WinBUGS to produce the results. * Provides numerous real examples for illustrating the theoretical concepts and computational procedures that are presented throughout the book. Researchers and advanced level students in statistics, biostatistics, public health, business, education, psychology and social science will benefit from this book.

Anbieter: Orell Fuessli CH
Stand: 06.07.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
96,90 CHF *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a 'dual beam' platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules – no need to 'read it all' to understand a topic Includes an online supplement—an extensive 'Database of Electron–Solid Interactions'—which can be accessed on SpringerLink, in Chapter 3

Anbieter: Orell Fuessli CH
Stand: 06.07.2020
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Structural Equation Modeling
54,90 CHF *
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Sponsored by the American Educational Research Association's Special Interest Group for Educational Statisticians This volume is the second edition of Hancock and Mueller's highly-successful 2006 volume, with all of the original chapters updated as well as four new chapters. The second edition, like the first, is intended to serve as a didactically-oriented resource for graduate students and research professionals, covering a broad range of advanced topics often not discussed in introductory courses on structural equation modeling (SEM). Such topics are important in furthering the understanding of foundations and assumptions underlying SEM as well as in exploring SEM, as a potential tool to address new types of research questions that might not have arisen during a first course. Chapters focus on the clear explanation and application of topics, rather than on analytical derivations, and contain materials from popular SEM software.

Anbieter: Orell Fuessli CH
Stand: 06.07.2020
Zum Angebot
Structural Equation Modeling
54,90 CHF *
ggf. zzgl. Versand

This volume is intended to serve as a didactically-oriented resource covering a broad range of advanced topics often not discussed in introductory courses on structural equation modeling (SEM). Such topics are important in furthering the understanding of foundations and assumptions underlying SEM as well as in exploring SEM as a potential tool to address new types of research questions that might not have arisen during a first course. Chapters focus on the clear explanation and application of topics, rather than on analytical derivations, and contain syntax and partial output files from popular SEM software.

Anbieter: Orell Fuessli CH
Stand: 06.07.2020
Zum Angebot
Automated Nanohandling by Microrobots
254,90 CHF *
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The rapid development of nanotechnology has created a need for advanced nanohandling tools and techniques. One active branch of research in this area focuses on the use of microrobots for automated handling of micro- and nanoscale objects. 'Automated Nanohandling by Microrobots' presents work on the development of a versatile microrobot-based nanohandling robot station inside a scanning electron microscope (SEM). The SEM serves as a powerful vision sensor, providing a high resolution and a high depth of focus, allowing different fields of application to be opened up. The pre-conditions for using an SEM are high-precise, user-friendly microrobots which can be integrated into the SEM chamber and equipped with application-specific tools. 'Automated Nanohandling by Microrobots' introduces an actuation principle for such microrobots and presents a new robot design. The book also introduces the concept of the robot station inside an SEM, along with the station's control system. Different aspects of this research field regarding the hardware and software implementation of the system components, including the sensory feedback for automated nanohandling, are discussed in detail. Images of the robot and its endeffector, as well as of the objects to be handled, are used as visual feedback by the automatic control system of the robot station. Extensive applications of the microrobot station for nanohandling, nano-characterisation and nanostructuring are provided, together with the experimental results. In addition, the use of an atomic force microscope as a nanohandling robot is investigated. Based upon the Microrobotics course for students of computer sciences and physics at the University of Oldenburg, Automated Nanohandling by Microrobots provides the practicing engineer and the engineering student with an introduction to the design and applications of robot-based nanohandling devices. Those unfamiliar with the subject will find the text, which is complemented throughout by the extensive use of illustrations, clear and simple to understand. TOC:Trends in Nanohandling.- Robot-based Automated Nanohandling.- Learning Controller for Microrobots.- Real-time Object Tracking inside an SEM.- 3D Imaging System for SEM.- Force Feedback for Nanohandling.- Characterization and Handling of Carbon Nanotubes.- Characterization and Handling of Biological Cells.- Material Nanotesting.- Nanostructuring and Nanobonding by EBiD.

Anbieter: Orell Fuessli CH
Stand: 06.07.2020
Zum Angebot
Basic and Advanced Bayesian Structural Equation...
85,00 CHF *
ggf. zzgl. Versand

This book provides clear instructions to researchers on how to apply Structural Equation Models (SEMs) for analyzing the inter relationships between observed and latent variables. Basic and Advanced Bayesian Structural Equation Modeling introduces basic and advanced SEMs for analyzing various kinds of complex data, such as ordered and unordered categorical data, multilevel data, mixture data, longitudinal data, highly non-normal data, as well as some of their combinations. In addition, Bayesian semiparametric SEMs to capture the true distribution of explanatory latent variables are introduced, whilst SEM with a nonparametric structural equation to assess unspecified functional relationships among latent variables are also explored. Statistical methodologies are developed using the Bayesian approach giving reliable results for small samples and allowing the use of prior information leading to better statistical results. Estimates of the parameters and model comparison statistics are obtained via powerful Markov Chain Monte Carlo methods in statistical computing. * Introduces the Bayesian approach to SEMs, including discussion on the selection of prior distributions, and data augmentation. * Demonstrates how to utilize the recent powerful tools in statistical computing including, but not limited to, the Gibbs sampler, the Metropolis-Hasting algorithm, and path sampling for producing various statistical results such as Bayesian estimates and Bayesian model comparison statistics in the analysis of basic and advanced SEMs. * Discusses the Bayes factor, Deviance Information Criterion (DIC), and $L_nu$-measure for Bayesian model comparison. * Introduces a number of important generalizations of SEMs, including multilevel and mixture SEMs, latent curve models and longitudinal SEMs, semiparametric SEMs and those with various types of discrete data, and nonparametric structural equations. * Illustrates how to use the freely available software WinBUGS to produce the results. * Provides numerous real examples for illustrating the theoretical concepts and computational procedures that are presented throughout the book. Researchers and advanced level students in statistics, biostatistics, public health, business, education, psychology and social science will benefit from this book.

Anbieter: Orell Fuessli CH
Stand: 06.07.2020
Zum Angebot