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Scanning Electron Microscopy and X-Ray Microana...
79,99 € *
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This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules - no need to "read it all" to understand a topic Includes

Anbieter: buecher
Stand: 28.05.2020
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Investigation of Heavy Metals Removal from Cont...
49,90 € *
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In present study, Light weight Expanded Clay Aggregate (LECA) coated with iron (Fe) oxide has been explored as a green and low cost sorbent to remove Ni (II) from polluted water. Iron Oxide Coated LECA (IOCL) as a new sorbent was examined for its efficiency as Ni (II) sorbent by change the operational parameters, such as contact time, initial pH of the solutions, sorbent dosages and initial Ni (II) concentration in batch systems. Also the adsorption characteristics of Natural LECA (NL) and IOCL were examined trough X-ray Fluorescence Spectroscopy (XRF), Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD) and Fourier Transform Infrared (FTIR) spectroscopy analysis. Results revealed that modified sorbent have a rougher surface with holes and cave type opening on the surface, which state high porosity and favorable surface area for adsorption process. The surface area increased due to coating process. The results obtained from Design-Expert software indicate that a IOCL dosage of 5.0 g.L-1, initial solution pH of 6.2 and initial Ni (II) concentration of 50.0 mg.L-1 in contact time of 2 h, has the optimum condition for removal of Ni (II) in domain of experiments.

Anbieter: Dodax
Stand: 28.05.2020
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Electric Discharge Machining
35,90 € *
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With the development of technology and industries, newer materials such as Tungsten, Molybdenum etc. and various other Super Alloys and Ceramics have been developed which are being widely used in nuclear engineering, aerospace and various other industries because of their hardness, heat resistance qualities and high strength to weight ratio. Machining of these hard materials is very difficult by conventional machining processes. Therefore non-conventional machining processes have been developed for the machining of such type of materials. The Objective of this work is mainly to study the effect of various input parameters like Electrode material, Discharge Current, Gap Voltage, Pulse-On Time, Pulse-Off Time on the various output parameters like MRR, TWR and Surface roughness. In this study, these output parameters are studied by using the Taguchi's Design of Experiments through Minitab software. Using this software, Means and S/N ratios for all the output parameters were calculated. Micro structure was also observed using SEM machine.

Anbieter: Dodax
Stand: 28.05.2020
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Magnetic Nanowires
79,00 € *
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Magnetic nanostructures have attracted increasing attention because of their potential applications in high-density data storage and in sensor technology. An understanding of the fundamental physical properties of these nanostructures is of interest in the study of atomic structures and micromagnetism. This book presents a study on the growth of nickel nanowires in commercially available templates. Electrodeposition was used through the pores of a template to produce nanowire matrices. Dependence of the nanowire growth rate, quality of deposit, growth uniformity, crystal orientations and other physical properties of the nanowire network were studied using various process parameters. Structural properties of the nanowire were characterised using AFM, SEM, EDX and TEM. Magnetic properties of the nanowires were studied using a VSM and MFM. Using OOMMF software magnetic behaviour of the nanowires was simulated and compared with the experimental coercivity values and magnetisation behaviour. The target audience of this book is the postgraduate students and the researchers who would like to study the fabrication and characterisation of magnetic nanowires.

Anbieter: Dodax
Stand: 28.05.2020
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Heat and Mass Transfer in Urea Prilling Process
49,00 € *
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Urea prills are produced in the prilling tower, where a cooling-solidification-cooling process of the prills takes place. The ambient air is used as the cooling stream for this process. A case study of the urea prilling process is chosen due to in hot/humid days, the temperature of the product at the bottom of the prilling tower is hot and cannot be packed directly. In addition, the urea prills form lumps and cakes with each other on the scrubber at the bottom of the prilling tower that affects the quality of the product. A mathematical model based on the particle kinematics,and, heat and mass transfer between the urea prills and the cooling air is developed. This is followed by using a numerical technique with an explicit scheme to solve the model. The model numerical results are validated with Scanning Electronic Microscope (SEM) observation of urea particles. Moreover,to investigate the effect of the urea prilling tower configuration parameters on the above urea product problems, the hydrodynamic of air flow inside the tower is analyzed using Computational Fluid Dynamics (CFD) simulation software.

Anbieter: Dodax
Stand: 28.05.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
92,67 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 28.05.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
139,78 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 28.05.2020
Zum Angebot
Machining of Inconel625 Flat Surfaces With Mult...
39,89 € *
ggf. zzgl. Versand

With progressions in technological advancements, new materials are being developed to meet industrial requirements. One such Nickel based super alloy is Inconel 625. Inconel 625 exhibits extraordinary mechanical properties along with chemical stability at high temperature. Due to extraordinary mechanical, physical and chemical properties, Inconel 625 is exceptionally hard to machine/finish. In this book, magnetic abrasive finishing process has been proposed to finish flat Inconel 625 surfaces. Three different parameters processing time, pole rotational speed and weight percentage of abrasives and their range has been selected. Design expert software has been used to plan experiments. Seventeen experiments were conducted as per experimental plan. The effect of process parameters on output characteristics (Percentage improvement in surface finish and Material removed) has been analyzed. Microscopic analysis and SEM analysis of few work pieces has been also provided to analyze the effect of process parameters.

Anbieter: Dodax
Stand: 28.05.2020
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Basic and Advanced Bayesian Structural Equation...
153,00 CHF *
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This book provides clear instructions to researchers on how to apply Structural Equation Models (SEMs) for analyzing the inter relationships between observed and latent variables. Basic and Advanced Bayesian Structural Equation Modeling introduces basic and advanced SEMs for analyzing various kinds of complex data, such as ordered and unordered categorical data, multilevel data, mixture data, longitudinal data, highly non-normal data, as well as some of their combinations. In addition, Bayesian semiparametric SEMs to capture the true distribution of explanatory latent variables are introduced, whilst SEM with a nonparametric structural equation to assess unspecified functional relationships among latent variables are also explored. Statistical methodologies are developed using the Bayesian approach giving reliable results for small samples and allowing the use of prior information leading to better statistical results. Estimates of the parameters and model comparison statistics are obtained via powerful Markov Chain Monte Carlo methods in statistical computing. * Introduces the Bayesian approach to SEMs, including discussion on the selection of prior distributions, and data augmentation. * Demonstrates how to utilize the recent powerful tools in statistical computing including, but not limited to, the Gibbs sampler, the Metropolis-Hasting algorithm, and path sampling for producing various statistical results such as Bayesian estimates and Bayesian model comparison statistics in the analysis of basic and advanced SEMs. * Discusses the Bayes factor, Deviance Information Criterion (DIC), and $L_nu$-measure for Bayesian model comparison. * Introduces a number of important generalizations of SEMs, including multilevel and mixture SEMs, latent curve models and longitudinal SEMs, semiparametric SEMs and those with various types of discrete data, and nonparametric structural equations. * Illustrates how to use the freely available software WinBUGS to produce the results. * Provides numerous real examples for illustrating the theoretical concepts and computational procedures that are presented throughout the book. Researchers and advanced level students in statistics, biostatistics, public health, business, education, psychology and social science will benefit from this book.

Anbieter: Orell Fuessli CH
Stand: 28.05.2020
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