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Software Engineering and Middleware
70,29 € *
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Erscheinungsdatum: 13.04.2005, Medium: Taschenbuch, Einband: Kartoniert / Broschiert, Titel: Software Engineering and Middleware, Titelzusatz: 4th International Workshop, SEM 2004, Linz, Austria, September 20-21, 2004 Revised Selected Papers, Auflage: 2005, Redaktion: Gschwind, Thomas // Mascolo, Cecilia, Verlag: Springer Berlin Heidelberg // Springer Berlin, Sprache: Englisch, Schlagworte: EDV // Theorie // Software-Entw // Allgemeines // Distributed Data Processing // Informationssystem // Verteiltes System, Rubrik: Informatik, Seiten: 260, Informationen: Paperback, Gewicht: 400 gr, Verkäufer: averdo

Anbieter: averdo
Stand: 05.04.2020
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Scanning Electron Microscopy and X-Ray Microana...
79,99 € *
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This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules - no need to "read it all" to understand a topic Includes

Anbieter: buecher
Stand: 05.04.2020
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Scanning Electron Microscopy and X-Ray Microana...
79,99 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules - no need to "read it all" to understand a topic Includes

Anbieter: buecher
Stand: 05.04.2020
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SAP Business Planning and Consolidation - Guidl...
92,00 € *
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The book is aimed primarily at employees in the finance, controlling, planning and IT departments. Likewise to Business experienced IT and Business Consultant.As with most software implementations, implementing or moving to Business Process and Consolidation (BPC), an SAP application for financial planning and consolidation, requires more than just technical know-how. Although the big beneficiaries of the BPC implementation are financial planners, controllers and analysts, the success (or failure) of many other actors is influenced by the implementation of SAP BPC. It should be clear to all involved that BPC can not equate a SEM-BCS system with its professional versatility. This primarily relates to the IFRS-compliant consolidation application in the daily FAST CLOSING PROCESS in legal and management consolidation. In addition, support for the SAP application SEM-BCS is more effective than the limited support / support resources at SAP BPC.In large corporations, a combined application of SEM-BCS with BPC is performed, which is an optimal complement between actual consolidation and planning / budgeting.To what extent in the future in a cloud landscape an effective integration of the components S / 4HANA, BPC, IP and SEM-BCS respectively BOFC successfully designed the FAST CLOSING PROCESS will depend to a great extent on the know-how of the business consultant, IT colleagues, users and SAP support.This book is your comprehensive guide to setting up standard and embedded SAP BPC. Preview Real-Time Consolidation and see how to migrate to SAP BPC 10.1 to stay on the cutting edge of SAP BPC.Application examples show the handling and setting of the following functions-Implement standard and embedded SAP BPC-Set up consolidation: ownership, intercompany eliminations, journal entries.....-Standard and embedded SAP BPC-Reporting-Data loading-Forecasting, planning-Consolidation-SAP HANA-Data Manager-Migration-Real-Time Consolidation

Anbieter: Dodax
Stand: 05.04.2020
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Aluminium based alloys with transition metals
35,90 € *
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Non equilibrium crystallization of Aluminium based alloys with transition metals. The solidification of Al-rich Al-Mn alloys (3.5 %, 4 % & 4.5 % wt) and Al-rich Al-Cu-Mn system has been studied both experimentally and by calculation of the phase equilibria using ThermoCalc software. For Al-Mn system, the results of the previous studies which indicated that one or more stable intermetallic phases get suppressed on solidification from the liquid, have been confirmed. Al-Mn-Cu ternary system in the aluminium rich region is experimentally investigated in as-cast state. Phase relations and solubility limits have been determined for the binary and ternary compounds using SEM/EDS, EPMA and XRD techniques. The ternary compound 1 has been found in the Al-Cu-Mn system, the compositions and it's homogeneity ranges has also been determined. This phase forms not only by U4 or U7 type reactions but also by ternary eutectic E2 type reaction in Al-rich region. The composition of 1 has an average composition of Al20Mn3Cu2/ Mn6Cu4Al29. It is much better to consider a general composition of Mn6+xCu4+yAl29-x-y.

Anbieter: Dodax
Stand: 05.04.2020
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Scanning Electron Microscopy and X-Ray Microana...
105,89 € *
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This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 05.04.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
81,96 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 05.04.2020
Zum Angebot
System Engineering Management
230,00 CHF *
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A practical, step-by-step guide to total systems management Systems Engineering Management, Fifth Edition is a practical guide to the tools and methodologies used in the field. Using a 'total systems management' approach, this book covers everything from initial establishment to system retirement, including design and development, testing, production, operations, maintenance, and support. This new edition has been fully updated to reflect the latest tools and best practices, and includes rich discussion on computer-based modeling and hardware and software systems integration. New case studies illustrate real-world application on both large- and small-scale systems in a variety of industries, and the companion website provides access to bonus case studies and helpful review checklists. The provided instructor's manual eases classroom integration, and updated end-of-chapter questions help reinforce the material. The challenges faced by system engineers are candidly addressed, with full guidance toward the tools they use daily to reduce costs and increase efficiency. System Engineering Management integrates industrial engineering, project management, and leadership skills into a unique emerging field. This book unifies these different skill sets into a single step-by-step approach that produces a well-rounded systems engineering management framework. * Learn the total systems lifecycle with real-world applications * Explore cutting edge design methods and technology * Integrate software and hardware systems for total SEM * Learn the critical IT principles that lead to robust systems Successful systems engineering managers must be capable of leading teams to produce systems that are robust, high-quality, supportable, cost effective, and responsive. Skilled, knowledgeable professionals are in demand across engineering fields, but also in industries as diverse as healthcare and communications. Systems Engineering Management, Fifth Edition provides practical, invaluable guidance for a nuanced field.

Anbieter: Orell Fuessli CH
Stand: 05.04.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
96,90 CHF *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a 'dual beam' platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules – no need to 'read it all' to understand a topic Includes an online supplement—an extensive 'Database of Electron–Solid Interactions'—which can be accessed on SpringerLink, in Chapter 3

Anbieter: Orell Fuessli CH
Stand: 05.04.2020
Zum Angebot