Angebote zu "Technology" (19 Treffer)

Kategorien

Shops

Scanning Electron Microscopy and X-Ray Microana...
79,02 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: buecher
Stand: 24.09.2020
Zum Angebot
Electric Discharge Machining
35,90 € *
ggf. zzgl. Versand

With the development of technology and industries, newer materials such as Tungsten, Molybdenum etc. and various other Super Alloys and Ceramics have been developed which are being widely used in nuclear engineering, aerospace and various other industries because of their hardness, heat resistance qualities and high strength to weight ratio. Machining of these hard materials is very difficult by conventional machining processes. Therefore non-conventional machining processes have been developed for the machining of such type of materials. The Objective of this work is mainly to study the effect of various input parameters like Electrode material, Discharge Current, Gap Voltage, Pulse-On Time, Pulse-Off Time on the various output parameters like MRR, TWR and Surface roughness. In this study, these output parameters are studied by using the Taguchi's Design of Experiments through Minitab software. Using this software, Means and S/N ratios for all the output parameters were calculated. Micro structure was also observed using SEM machine.

Anbieter: Dodax
Stand: 24.09.2020
Zum Angebot
Magnetic Nanowires
79,00 € *
ggf. zzgl. Versand

Magnetic nanostructures have attracted increasing attention because of their potential applications in high-density data storage and in sensor technology. An understanding of the fundamental physical properties of these nanostructures is of interest in the study of atomic structures and micromagnetism. This book presents a study on the growth of nickel nanowires in commercially available templates. Electrodeposition was used through the pores of a template to produce nanowire matrices. Dependence of the nanowire growth rate, quality of deposit, growth uniformity, crystal orientations and other physical properties of the nanowire network were studied using various process parameters. Structural properties of the nanowire were characterised using AFM, SEM, EDX and TEM. Magnetic properties of the nanowires were studied using a VSM and MFM. Using OOMMF software magnetic behaviour of the nanowires was simulated and compared with the experimental coercivity values and magnetisation behaviour. The target audience of this book is the postgraduate students and the researchers who would like to study the fabrication and characterisation of magnetic nanowires.

Anbieter: Dodax
Stand: 24.09.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
85,06 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 24.09.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
129,46 € *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation.Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes

Anbieter: Dodax
Stand: 24.09.2020
Zum Angebot
The Semantic Web: Research and Applications
191,00 CHF *
ggf. zzgl. Versand

This volume contains the papers presented at the 2nd European Semantic Web Conference (ESWC 2005) held in Heraklion, Crete, Greece, from 29th May to 1st June, 2005. The vision of the Semantic Web is to enhance today’s Web via the exploi- tion of machine-processable metadata. The explicit representation of the sem- tics of data, accompanied with domain theories (ontologies), will enable a web that provides a qualitatively new level of service. It will weave together an - crediblylargenetworkofhumanknowledgeandwillcomplementitwithmachine processability. Various automated services will help the user to achieve goals by accessing and providing information in a machine-understandable form. This process may ultimately create extremely knowledgeable systems with various specialized reasoning services systems. Many technologies and methodologies are being developed within arti?cial intelligence, human language technology, machine learning, databases, software engineering and information systems that can contribute to the realization of this vision. The 2nd Annual European Semantic Web Conference presented the latest results in research and applications of Semantic Web technologies. Following the success of the ?rst edition, ESWC showed a signi?cant increase in participation. With148submissions,thenumberofpapersdoubledthatofthepreviousedition. Each submission was evaluated by at least three reviewers. The selection process resulted in the acceptance of 48 papers for publication and presentation at the conference (an acceptance rate of 32%). Papers did not come only from Europe but also from other continents.

Anbieter: Orell Fuessli CH
Stand: 24.09.2020
Zum Angebot
System Engineering Management
230,00 CHF *
ggf. zzgl. Versand

A practical, step-by-step guide to total systems management Systems Engineering Management, Fifth Edition is a practical guide to the tools and methodologies used in the field. Using a 'total systems management' approach, this book covers everything from initial establishment to system retirement, including design and development, testing, production, operations, maintenance, and support. This new edition has been fully updated to reflect the latest tools and best practices, and includes rich discussion on computer-based modeling and hardware and software systems integration. New case studies illustrate real-world application on both large- and small-scale systems in a variety of industries, and the companion website provides access to bonus case studies and helpful review checklists. The provided instructor's manual eases classroom integration, and updated end-of-chapter questions help reinforce the material. The challenges faced by system engineers are candidly addressed, with full guidance toward the tools they use daily to reduce costs and increase efficiency. System Engineering Management integrates industrial engineering, project management, and leadership skills into a unique emerging field. This book unifies these different skill sets into a single step-by-step approach that produces a well-rounded systems engineering management framework. * Learn the total systems lifecycle with real-world applications * Explore cutting edge design methods and technology * Integrate software and hardware systems for total SEM * Learn the critical IT principles that lead to robust systems Successful systems engineering managers must be capable of leading teams to produce systems that are robust, high-quality, supportable, cost effective, and responsive. Skilled, knowledgeable professionals are in demand across engineering fields, but also in industries as diverse as healthcare and communications. Systems Engineering Management, Fifth Edition provides practical, invaluable guidance for a nuanced field.

Anbieter: Orell Fuessli CH
Stand: 24.09.2020
Zum Angebot
Scanning Electron Microscopy and X-Ray Microana...
96,90 CHF *
ggf. zzgl. Versand

This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners — engineers, technicians, physical and biological scientists, clinicians, and technical managers — will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc. In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope’s software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD). With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a 'dual beam' platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling. New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process. This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managers Emphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful results Provides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurements Makes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solving Covers Helium ion scanning microscopy Organized into relatively self-contained modules – no need to 'read it all' to understand a topic Includes an online supplement—an extensive 'Database of Electron–Solid Interactions'—which can be accessed on SpringerLink, in Chapter 3

Anbieter: Orell Fuessli CH
Stand: 24.09.2020
Zum Angebot
System Engineering Management
135,00 CHF *
ggf. zzgl. Versand

A practical, step-by-step guide to total systems management Systems Engineering Management, Fifth Edition is a practical guide to the tools and methodologies used in the field. Using a 'total systems management' approach, this book covers everything from initial establishment to system retirement, including design and development, testing, production, operations, maintenance, and support. This new edition has been fully updated to reflect the latest tools and best practices, and includes rich discussion on computer-based modeling and hardware and software systems integration. New case studies illustrate real-world application on both large- and small-scale systems in a variety of industries, and the companion website provides access to bonus case studies and helpful review checklists. The provided instructor's manual eases classroom integration, and updated end-of-chapter questions help reinforce the material. The challenges faced by system engineers are candidly addressed, with full guidance toward the tools they use daily to reduce costs and increase efficiency. System Engineering Management integrates industrial engineering, project management, and leadership skills into a unique emerging field. This book unifies these different skill sets into a single step-by-step approach that produces a well-rounded systems engineering management framework. * Learn the total systems lifecycle with real-world applications * Explore cutting edge design methods and technology * Integrate software and hardware systems for total SEM * Learn the critical IT principles that lead to robust systems Successful systems engineering managers must be capable of leading teams to produce systems that are robust, high-quality, supportable, cost effective, and responsive. Skilled, knowledgeable professionals are in demand across engineering fields, but also in industries as diverse as healthcare and communications. Systems Engineering Management, Fifth Edition provides practical, invaluable guidance for a nuanced field.

Anbieter: Orell Fuessli CH
Stand: 24.09.2020
Zum Angebot